I've been thinking of a way to improve my latest refrigerant factory save, and I've run into one big issue which is how to seperate RFRG from excess unreacted CAUS.
So far I've just been using a "pressure differential" to sort the reactant GAS & CAUS from the RFGL, and a small screen of VOID as a secondary safeguard to protect the STOR intakes from corrosion.
3365195View Save 3365195
I did think one one potential cool solution, but I think it may not be possible in this specific case: Seperate fluids by density. My rationale being, if I can do the seperation by liquid density sorting that would partially solve the issue of corrosion. Problem is I don't think there's actually any lighter fluids which RFGL will sink in, is there?
Has anyone got suggestions on how else to scrub the output of any excess CAUS, or reccomendations of a fluid lighter than RFGL that I can use to seperate and insulate it?
According to the wiki, future element BASE will react with CAUS to produce SLTW. For now, CONV(SLTW) with tmp=CAUS can be used as a sort of solid base that will only be used up very slowly (if at all). After modifying your save using that approach, I found that it takes some abuse just to get to the second layer of CONV within a couple of minutes.
BASE could be circulated (and constantly topped up) to make a sort of scrubbing system.
-and then SLTW just desalinated and recycled.
I already tried CONV (tmp=EMBR, a common trick for deleting elements). It tended to degrate too quickly.
In my modified version, the CONV degrades very slowly or not at all (to the point where I've never seen it let any CAUS through without removing the pressure differential and blocking the GAS line) regardless of whether it's CONV(SLTW) or CONV(EMBR). I already added the SLTW recycling system. Solid base is meant to be used up; maybe layer the CONV with 0 velocity GRVT if you want to make it look like it's intact.
You could just set the pressure to anything between 2 and 6. GAS and CAUS will float upwards while the RFGL will fall downwards. If you keep a sufficient amount of RFGL in the separation chamber there's no chance for GAS or CAUS to enter the RFGL outlet.
I just tried the new v100 update and sadly the new element doesn't solve the issue:
Unfortunately, CAUS and RFGL both dissolve in BASE at the same concentration (41 apparently according to me testing). So using diluted BASE as a gas scrubbing system is not possible...
Its perhaps possible at a later date that elements are given more discreet "hardness" ratings?
(also BASE destroys STOR at any concentrations >1 which would introduce it's own design issues, but at least unlike CAUS I could fairly easily seperate off any RFGL by boiling it out, *if it could neutralize CAUS at lower concentration...)
CAUS movement is a bit too erratic to rely on solely, it doesn't really float upwards it mostly floats in every direction equally ( and there is a pretty generous pressure gradient already intended to keep it at the top of the chamber, however one or two pixels still tends to squeak through hence the 'safety' filter of void. )
Edit: I have since learned that BASE at lower concentrations than 74 is actually less reactive than regular WATR with ACID/CAUS. So it's ACID neutralizing properties are near-worthless for these kinds of applications (loads of elements have a default "hardness" value of 1 too), so you can have situations where BASE will dissolve NBLE gas meanwhile it's literally floating on top of a bed of ACID and not reacting.